| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer compound and a resist material responding to a high energy beam and having an alkali-dissolving contrast and excellent plasma etching resistance without impairing transparency in ≤200 nm wavelength. <P>SOLUTION: The polymer compound comprises a recurring unit having a functional group represented by formula (1) (wherein R<SP>1</SP>is CH<SB>2</SB>, O, S or SO<SB>2</SB>; R<SP>2</SP>to R<SP>5</SP>are each H, F, an alkyl group or a fluorinated alkyl group, R<SP>6</SP>-SO<SB>3</SB>R<SP>7</SP>or R<SP>6</SP>-SO<SB>2</SB>R<SP>7</SP>and at least one among R<SP>2</SP>to R<SP>5</SP>contains R<SP>6</SP>-SO<SB>3</SB>R<SP>7</SP>or R<SP>6</SP>-SO<SB>2</SB>R<SP>7</SP>; R<SP>6</SP>is a single bond or an alkylene group or a fluorinated alkylene group; R<SP>7</SP>is F or a fluorinated alkyl group which may contain a hydrophilic group such as hydroxy group; and a is 0 or 1), and has 1,000 to 500,000 weight average molecular weight. <P>COPYRIGHT: (C)2004,JPO |
