| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device and a variable power distributor capable of realizing plasma, treatment speed/space distribution control at a low cost without changing a structure in a treatment chamber. <P>SOLUTION: The treatment chamber 1, a double wave guide 2, a microwave generator 3, a variable power distributor 4, and an automatic impedance tuner 5 are provided. A center windor 7 and a peripheral window 8 for introducing microwave are provided on an upper part of the treatment chamber 1. A first opening/closing member 4a and a second opening/closing member 4e for respectively opening/closing a center path 4b and a peripheral path 4c are provided in the center path 4b and the peripheral path 4c provided on the variable power distributor 4. By moving the first opening/closing member 4d and the second opening/closing member 4e, a ratio between microwave power supplied from the center window 7 into the treatment chamber 1 through an inner tube 2a and microwave power supplied from the peripheral window 8 into the treatment chamber 1 through the peripheral path 4c and an outer tube 2b is controlled, thereby controlling plasma, treatment speed/space distribution in the treatment chamber 1. <P>COPYRIGHT: (C)2004,JPO |
