发明名称 |
METHOD FOR IMPROVED DIELECTRIC LAYER METROLOGY CALIBRATION |
摘要 |
A method for measuring a dielectric layer thickness calibration reference standard including providing a substrate having a dielectric layer for calibrating a dielectric layer thickness measuring tool; cleaning the dielectric layer according to a cleaning process including at least one of spraying and scrubbing; and, measuring the thickness of the dielectric layer with the dielectric layer thickness measuring tool including at least one portion of the dielectric layer displaced from the substrate center.
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申请公布号 |
US2004004730(A1) |
申请公布日期 |
2004.01.08 |
申请号 |
US20020189052 |
申请日期 |
2002.07.02 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LEE PEY-YUAN;LO CHI-SHEN;HORNG SHEAN-REN;TSENG HAN-LIANG;YOU WEI-MING;CHEN YI-HUNG |
分类号 |
G01B11/06;(IPC1-7):G01B11/06 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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