发明名称 METHOD FOR IMPROVED DIELECTRIC LAYER METROLOGY CALIBRATION
摘要 A method for measuring a dielectric layer thickness calibration reference standard including providing a substrate having a dielectric layer for calibrating a dielectric layer thickness measuring tool; cleaning the dielectric layer according to a cleaning process including at least one of spraying and scrubbing; and, measuring the thickness of the dielectric layer with the dielectric layer thickness measuring tool including at least one portion of the dielectric layer displaced from the substrate center.
申请公布号 US2004004730(A1) 申请公布日期 2004.01.08
申请号 US20020189052 申请日期 2002.07.02
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LEE PEY-YUAN;LO CHI-SHEN;HORNG SHEAN-REN;TSENG HAN-LIANG;YOU WEI-MING;CHEN YI-HUNG
分类号 G01B11/06;(IPC1-7):G01B11/06 主分类号 G01B11/06
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