| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive chemically amplified resist composition which can improve resolution while maintaining sensitivity and a residual film rate at a high level. <P>SOLUTION: (1) The positive chemically amplified resist composition contains a crosslinking agent, an acid forming agent and a resin which itself is insoluble or hardly soluble in an alkaline aqueous solution and which has a protecting group cleavable by the effect of an acid and turns soluble in the alkaline aqueous solution after the cleavage of the protecting group. (2) The crosslinking agent in the composition described in (1) is a composition expressed by formula (1) or its condensate (where R<SP>1</SP>to R<SP>4</SP>may be the same as or different from each other and denote hydrogen atoms, 1-6C alkyl groups, 1-6C aminoalkyl groups, 1-6C hydroxyalkyl groups, 6-20C substituted or unsubstituted aryl groups or 2-6C alkoxy alkyl groups; provided that at least one among R<SP>1</SP>to R<SP>4</SP>is 2-6C alkoxy alkyl group, and either of R<SP>1</SP>and R<SP>2</SP>and either of R<SP>3</SP>and R<SP>3</SP>may bond each other to form a ring). <P>COPYRIGHT: (C)2004,JPO |
