NEGATIVELY ACTIVE THERMAL LITHOGRAPHIC PLATE PRECURSOR CONTAINING SMOOTH ALUMINUM SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To give a high run length and also to satisfy many other necessary requirements of a lithographic plate material, without necessitating other processing stages using alkaline chemicals.

SOLUTION: This precursor contains a polished and anodized aluminum substrate having a hydrophilic surface and a heat-sensitive coating containing hydrophobic thermoplastic polymer particles of which the hydrophobic phase can be formed in coating by heat-induction aggregation of polymer particles, and being provided on the hydrophilic surface. The substrate has a surface roughness less than 0.45 μm expressed as an arithmetic-mean center line roughness Ra. A lithographic plate having the high run length brought about by the smooth surface is prepared from the precursor.

COPYRIGHT: (C)2004,JPO