发明名称 METHOD FOR FORMING TRANSMITTED ELECTRON BEAM INTENSITY DISTRIBUTION IMAGE
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a transmitted electron beam intensity distribution image with high accuracy in regard to a method for forming a transmitted electron beam intensity distribution image of a contractive material by irradiating the contractive material with an electron beam. SOLUTION: This method is used for forming a transmitted electron beam intensity distribution image by irradiating the contractive material with an electron beam. The size of an incident electron beam is 0.1 to 2 nm, the scanning speed of the electron beam is 20 to 400 sec/frame, the current of the electron beam on a surface of the material is 1×10<SP>-12</SP>to 1×10<SP>-9</SP>A, and acceleration voltage for the electron beam is 50 to 400 kV. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004004042(A) 申请公布日期 2004.01.08
申请号 JP20030111285 申请日期 2003.04.16
申请人 SUMITOMO CHEM CO LTD 发明人 UCHIUMI SHINYA
分类号 G01N23/04;H01J37/28;(IPC1-7):G01N23/04 主分类号 G01N23/04
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