发明名称 VERTICAL BASE STRUCTURE WITHOUT SLIPPING
摘要 PROBLEM TO BE SOLVED: To provide a vertical base structure, which is prevented from slipping and which withstands high temperatures while being manufactured by a diamond saw and will not cast a big shadow on a wafer. SOLUTION: The vertical base for supporting a plurality of semiconductor wafers under separated and substantially parallel relations horizontally is equipped with (a) a vertical supporting means and (b) a plurality of vertically separated horizontal supporting means for dividing and forming a plurality of supporting stages for supporting wafers substantially horizontally and which are extended from the vertical supporting means. In this case, the horizontal supporting means are projections and respective projections are constituted of arms, ending at a wafer receiving table, while the arms are slanted and projected continuously upward so as to be ended at the wafer receiving table so that the most inner contact between at least one set of the wafer receiving table in respective supporting stages and a wafer supported by the receiving table becomes within a range between 20% and 80% of the radius of the wafer when it is measured from the rim of the wafer. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004006841(A) 申请公布日期 2004.01.08
申请号 JP20030119003 申请日期 2003.04.23
申请人 SAINT GOBAIN CERAMICS & PLASTICS INC 发明人 TOMANOVICH JOHN A
分类号 C23C16/458;H01L21/205;H01L21/22;H01L21/324;H01L21/673;H01L21/683;(IPC1-7):H01L21/324;H01L21/68 主分类号 C23C16/458
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