发明名称 SLURRY DELIVERY SYSTEM FOR CHEMICAL MECHANICAL POLISHER
摘要 A slurry delivery system for a chemical mechanical polisher, comprising a bag housing fitted with a slurry intake conduit and a slurry outlet conduit. An expandible and collapsible pump bag is provided in fluid communication with the conduits inside the bag housing, and the interior of the pump bag is sealed from the bag housing. As an air/vacuum controller withdraws air from the housing, the pump bag enlarges and slurry is drawn into the pump bag. As the air/vacuum controller subsequently introduces air into the housing, the pump bag collapses and the slurry is expelled from the pump bag through the slurry outlet conduit. A purge valve is provided upstream of the pump bag to remove air bubbles from the slurry and vent the air to the atmosphere.
申请公布号 US2004004090(A1) 申请公布日期 2004.01.08
申请号 US20020190220 申请日期 2002.07.05
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHEN WEI-TRAIN;CHEN WEN-TEIN
分类号 B24C7/00;B65D37/00;(IPC1-7):B65D37/00 主分类号 B24C7/00
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