发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is free of surface roughness and the degradation in transparency due to the high transmissivity at 400 to 780 nm, is free of coating application defects, has good resolution, and can improve the planarity of edges of a substrate, and to provide a color filter using this composition and a liquid crystal display. <P>SOLUTION: The photosensitive resin composition contains (A) a reaction product obtained by reacting the following (a) to (d); (a) a compound having a plurality of isocyanate groups, (b) monohydric alcohol, (c) a compound having 2 to 3 groups selected from the group consisting of an -OH group, an -NH<SB>2</SB>group, and an -NHR group (R denotes 1-4C alkyl group) and permissibly containing at least one group selected from the group consisting of an -O- group, a -COO- group, a -CONH- group, an -S- group, and an -SO<SB>2</SB>- group, (d) a tertiary amine compound, (B) a binder polymer, (C) a photopolymerizable compound, (D) a photopolymerization initiator, and (E) a solvent and does not substantially contain coloring agents. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004004531(A) 申请公布日期 2004.01.08
申请号 JP20030013207 申请日期 2003.01.22
申请人 SUMITOMO CHEM CO LTD 发明人 ICHIKAWA KOJI
分类号 G03F7/004;C08G18/78;G02B5/20 主分类号 G03F7/004
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