发明名称 |
METHOD AND APPARATUS FOR EXPOSURE |
摘要 |
PURPOSE: To constitute in simple structure a driving mechanism for moving a support device supporting an exposed body having a mask and a photosensitive material while reducing a physical load on the driving mechanism. CONSTITUTION: An exposing method includes an incidence step of making at least a portion of the light from a light source for exposure incident on the mask supported by the support device, an imaging step of imaging transmitted light from the mask on the photosensitive material by making the transmitted light incident from a direction different from the direction of light incidence on the mask, a rotating step of rotating the support device so that the position of the mask irradiated with the light from the light source changes in a circumferential direction, and an irradiated position changing step of changing the irradiated positions of the mask and photosensitive material irradiated with the light change in directions different from the circumferential direction during the rotation of the support device.
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申请公布号 |
KR20040002426(A) |
申请公布日期 |
2004.01.07 |
申请号 |
KR20030004636 |
申请日期 |
2003.01.23 |
申请人 |
KABUSHIKI KAISHA EKISHO SENTAN GIJUTSU KAIHATSU CENTER |
发明人 |
TSUJIKAWA SUSUMU;TANIGUCHI YUKIO;YAMAGUCHI HIROTAKA;MATSUMURA MASAKIYO |
分类号 |
G03B27/42;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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