SEMICONDUCTOR DEVICE HAVING ISOLATION REGION OF CONSTANT WIDTH AND FABRICATING METHOD THEREFOR

摘要

PURPOSE: A semiconductor device having an isolation region of constant width and a fabricating method therefor are provided to improve a characteristic of a cell transistor and a contact resistance by forming a narrow trench in an inactive region. CONSTITUTION: A semiconductor device having an isolation region of constant width includes a semiconductor substrate, a trench, and an isolation layer. The semiconductor substrate includes an active region(101) and an inactive region(103). A plurality of unit elements are formed on the active region(101). The inactive region(103) has a dummy region and the same width to the X/Y direction. The dummy region is inserted into the inactive region. The trench has the narrow width and corresponds to the inactive region. The isolation layer is formed within the trench.