| 发明名称 |
Structure for pattern formation, method for pattern formation, and application thereof |
| 摘要 |
<p>A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.</p> |
| 申请公布号 |
EP1376224(A1) |
申请公布日期 |
2004.01.02 |
| 申请号 |
EP20030021172 |
申请日期 |
1998.08.10 |
| 申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
KOBAYASHI, HIRONORI;YAMAMOTO, MANABU;AOKI, DAIGO;KAMIYAMA, HIRONORI;HIKOSAKA, SHINICHI;KASHIWABARA, MITSUHIRO |
| 分类号 |
G03F7/004;B41C1/10;B41N1/00;G03F7/00;G03F7/075;(IPC1-7):G03F7/004;G02B3/00;G02B5/20 |
主分类号 |
G03F7/004 |
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