发明名称 Vertex based layout pattern (VEP): a method and apparatus for describing repetitive patterns in IC mask layout
摘要 A method to describe a circuit pattern comprises identifying vertices and those edges of the circuit pattern that are not incident with any vertex contained within a region of interest within the circuit pattern. The region of interest includes a portion of a polygon that is less than the entire polygon. The vertices and edges of the circuit pattern are compared to a predetermined set of known vertices and edges. A match may be used to identify an acceptable circuit or a defective circuit.
申请公布号 US2004003357(A1) 申请公布日期 2004.01.01
申请号 US20020186372 申请日期 2002.06.28
申请人 PALUSINSKI MICHAL;NIEWCZAS MARIUSZ;MALY WOJCIECH;STOJWAS ANDREZEJ;WAAS THOMAS;EISENMANN HANS 发明人 PALUSINSKI MICHAL;NIEWCZAS MARIUSZ;MALY WOJCIECH;STOJWAS ANDREZEJ;WAAS THOMAS;EISENMANN HANS
分类号 G06F17/50;(IPC1-7):G06F17/50 主分类号 G06F17/50
代理机构 代理人
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