发明名称 |
Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus |
摘要 |
An illuminator for controlling a beam of radiation for a lithographic projection apparatus includes a plurality of optical elements and an exchanger for inserting and removing the optical elements from the beam path. The intensity distribution of the beam at a pupil plane of the illuminator is determined by the optical elements. Different illumination settings (intensity distributions) can be obtained by the exchanger swapping between different optical elements, without the need for a zoom-axicon module.
|
申请公布号 |
US6671035(B2) |
申请公布日期 |
2003.12.30 |
申请号 |
US20000733959 |
申请日期 |
2000.12.12 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
EURLINGS MARKUS F;KRIKKE JAN J |
分类号 |
G03F7/20;(IPC1-7):G03B27/72;G03B27/42 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|