发明名称 |
Positive-working resist composition |
摘要 |
The present invention provides a high sensitivity chemically amplified positive-working resist composition which eliminates edge roughness on pattern and provides an excellent resist pattern profile. A novel positive-working resist composition is provided comprising (A) a resin containing an alkali-soluble group protected by at least one of moieties containing alicyclic hydrocarbon represented by general formulae (pI) to (pVI) and having a monomer component content of 5% or less of the total pattern area as determined by gel permeation chromatography (GPC), which increases in its solution velocity with respect to an alkaline developer by the action of an acid and (B) a compound which is capable of generating an acid by irradiation with an active ray or radiation.
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申请公布号 |
US6670095(B2) |
申请公布日期 |
2003.12.30 |
申请号 |
US20010022363 |
申请日期 |
2001.12.20 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
SATO KENICHIRO;KODAMA KUNIHIKO;AOAI TOSHIAKI |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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