发明名称 Interferometric patterning for lithography
摘要 Production of interference patterns from incoherent light sources by using an optical filter, a field mirror, and a plane mirror. The optical filter is designed to filter incoherent light waves and generate coherent light waves. The field mirror is arranged to convert the coherent light waves into plane waves. The plane mirror is arranged as a Lloyd's mirror to generate interference patterns from the plane waves.
申请公布号 US6671054(B2) 申请公布日期 2003.12.30
申请号 US20020071814 申请日期 2002.02.07
申请人 INTEL CORPORATION 发明人 GOLDSTEIN MICHAEL
分类号 G01B9/02;G03F7/20;(IPC1-7):G01B9/02 主分类号 G01B9/02
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