发明名称 Position detection apparatus, position detection method, exposure apparatus, device manufacturing method, and substrate
摘要 A position detection apparatus which detects a position of a mark included in an object is disclosed. The apparatus comprises a sensing unit for sensing an image of the object, wherein a plurality of marks included in the object can be included in the image, a extracting unit for extracting feature of a region, other than a region of a target mark of the plurality of marks, of the image sensed by said sensing unit, and a calculating unit for calculating a position of the target mark based on the feature extracted by the extracting unit.
申请公布号 US2003235330(A1) 申请公布日期 2003.12.25
申请号 US20030446693 申请日期 2003.05.29
申请人 CANON KABUSHIKI KAISHA 发明人 TANAKA HIROSHI
分类号 G01B11/00;G03F9/00;G06T7/00;H01L21/00;H01L21/027;H01L21/68;(IPC1-7):G06K9/00 主分类号 G01B11/00
代理机构 代理人
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