| 摘要 |
PURPOSE: A thin film depositing apparatus and a thin film depositing method using the same are provided to be capable of improving the uniformity and depositing efficiency of a thin film without increasing the size of the depositing apparatus. CONSTITUTION: A thin film depositing apparatus is provided with a vacuum chamber(30), a substrate(10) installed at the inner portion of the vacuum chamber, a depositing source(20) installed opposite to the substrate, and a moving part(50) for moving the depositing source to and fro. Preferably, the moving part includes a cam(51) having a predetermined shape, a driving part(52) for driving the cam, an elastic part(53), and a connecting part(54). At this time, one end portion of the connecting part is connected with the depositing source and the other end portion of the connecting part contacts the cam. Preferably, the moving part further includes a control part(56) for controlling the driving timing of the driving part.
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