| 摘要 |
<p>This disclosure relates to a method for deaerating a liquid layer such as a coating solution using electrostatic forces. A flow of charged particles is created above and moved towards a low conductivity liquid layer. The flow of charged particles causes localized thinning of the liquid layer which facilitates the removal of bubbles of entrained gas from the liquid by bringing those bubbles closer to the exposed surface of the liquid and rupturing them at that surface. This electrostatic deaeration technique is combined with other non-electrostatic liquid layer thinning techniques or degassing techniques to further facilitate removal of bubbles from the liquid in preparation of further processing of the liquid. The liquid layer may be stationary or flowing with respect to the application of charge particles.</p> |
