发明名称 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
摘要 A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.
申请公布号 US6667484(B2) 申请公布日期 2003.12.23
申请号 US20010893347 申请日期 2001.06.28
申请人 ASML NETHERLANDS B.V. 发明人 KOSHELEV KONSTANTIN NIKOLAEVITCH;BIJKERK FREDERIK;ZUKAVISHVILI GIVI GEORGIEVITCH;KOROP EVGENII DMITREEVITCH;IVANOV VLADIMIR VITAL'EVITCH
分类号 G21K5/02;G03F7/20;H01L21/027;H05G2/00;H05H1/24;(IPC1-7):G03B41/16 主分类号 G21K5/02
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