METHOD OF FORMING SEMICONDUCTOR JUNCTIONS,BY ETCHING,MASKING,AND DIFFUSION,申请号USD3498853-传众专利搜索

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发明名称	METHOD OF FORMING SEMICONDUCTOR JUNCTIONS,BY ETCHING,MASKING,AND DIFFUSION
摘要
申请公布号	US3498853(A)	申请公布日期	1970.03.03
申请号	USD3498853	申请日期	1966.01.07
申请人	SIEMENS AG.	发明人	JOACHIM DATHE;WOLFGANG MULLER;SHIB GHOSH-DASTIDAR
分类号	C30B31/02;C30B31/06;H01L21/00;H01L21/22;(IPC1-7):H01L7/44	主分类号	C30B31/02
代理机构		代理人
主权项
地址

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