| 摘要 |
The invention is intended for commercializing a pattern transfer process using a graytone mask, wherein the mask has a graytone part constituted of a minute opaque pattern of a size smaller than a resolution limit of an aligner using a graytone mask. For example, a contour pattern 30 is formed in an area close to a graytone part 3 along a contour pattern of an opaque pattern 1 adjacent to the graytone part 3. |
