Optical system with correcting structure for producing product structure for substrate, with critical dimension and lithographic appliance

摘要

A correcting structure (C) is produced for making a product structure (D) of the substrate (2). The correction structure is dependent functionally on at least one image distortion of a lithography appliance and or is dependent on at least one product error in a subsequent production step of the substrate. The image distortion and or the production error is dependent on at least one critical dimension (CD) of a structure on the substrate.