NOZZLE DEVICE AND SUBSTRATE PROCESSING DEVICE WITH THE NOZZLE DEVICE

摘要

A nozzle device and a substrate processing device capable of preventing liquid from dripping after completing the application of the liquid and forming processing liquid film of uniform thickness on a substrate with small amount of processing liquid, the nozzle device (10) comprising a plurality of outlets (18) formed in the lower surface thereof, a liquid reserving chamber (22) for reserving the supplied processing liquid, and a plurality of liquid discharge flow passages (17) allowed to communicate with the outlets (18) for discharging the processing liquid from the outlets (18), wherein the upper ends of the liquid discharge flow passages (17) are positioned above the upper end of the liquid reserving chamber (22) and the liquid discharge flow passages (17) are allowed to communicate with the liquid reserving chamber (22) through a communication passage (23), and the minimum height dimension of the communication passage (23) is set to 0.05 to 0.2 mm and the minimum diameter of the liquid discharge flow passages (17) is set to 0.35 to 1.0 mm.