发明名称 METHOD AND DEVICE FOR CLEANING RAW MATERIAL GAS INTRODUCTION TUBE USED IN CVD FILM FORMING APPARATUS
摘要 <p>A method for cleaning a tube for introducing a raw material gas used in a CVD film forming apparatus, characterized in that it comprises, after the formation of a CVD film on the inner surface of a plastic container, spraying a compressed air toward a stain attached to the outer surface of the tube during a process of drawing the pipe out of the inside of the plastic container, to thereby remove the stain, and, at the same time, discharging the stain removed from the tube by the compressed air to the outside of the film forming chamber system by a suction and discharge means, so as for the stain not to transfer to the side of the film forming chamber and the plastic container having the formed CVD film; and a device for practicing the method. The method prevents a stain containing a carbon powder as a main component from adhering strongly onto the outer surface of the tube and allows the removal of the stain in a short time and with ease.</p>
申请公布号 WO2003104523(P1) 申请公布日期 2003.12.18
申请号 JP2003006331 申请日期 2003.05.21
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