发明名称 Bonded substrate structures and method for fabricating bonded substrate structures
摘要 In fabricating bonded substrate structures having a device-housing space therein, microstructures in the bonded substrates are prevented from being broken or damaged, and the yield of the bonded substrate structures fabricated is increased. A through-groove capable of connecting the device-housing space to the outside is formed in the bonded surface of one substrate. Thus configured, the atmosphere inside the device-housing space is kept the same as the outside atmosphere while openings that reach the device-housing space are formed through the bonded substrate structure by etching the structure, and the device-housing space is prevented from being subjected to any rapid pressure change in the process of forming the openings. The depth of the through-groove may be the same as that of the recess for the device-housing space. Thus configured, the through-groove may be formed in one and the same etching treatment for forming the device-housing space. The through-groove may be partly sealed with a Pb bump or the like, and the atmosphere inside the device-housing space can be insulated from the outside atmosphere in any stage of processing the bonded substrate structure.
申请公布号 US6663789(B2) 申请公布日期 2003.12.16
申请号 US20010910199 申请日期 2001.07.20
申请人 SONY CORPORATION 发明人 HARA MASAKI
分类号 B81B3/00;B81C1/00;H01L21/20;H01L21/50;H01L23/02;H01L23/04;H01L23/15;(IPC1-7):B29D11/00;H01L21/00 主分类号 B81B3/00
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