| 摘要 |
Methods of preparing first, second and Nth generation polymers by radical polymerization using specified dithiophosphoroether control agents. First generation polymers are prepared by radical polymerization of a composition comprising one or more ethylenically unsaturated monomers, a source of free radicals and one or more compounds of Formula (IIIA), (IIIB) and (IIIC); R1, R'1 = optionally substituted alkyl or acyl or aryl or aralkyl or alkene or alkyne, optionally substituted carbon cycle or aromatic heterocycle, a polymer chain; R2, R3, R'2 = H, -S-R1, optionally substituted alkyl or acyl or aryl or aralkyl or alkene or alkyne, optionally substituted carbon cycle or aromatic heterocycle, cyano, nitro, NR4R5; R'2+R3 = optionally substituted cycle comprising at least one nitrogen atom at the alpha position of the phosphorus and comprising carbon atoms or heteroatoms; R4, R5 = H, optionally substituted alkyl or acyl or aryl or aralkyl or alkene or alkyne, optionally substituted carbon cycle or aromatic heterocycle, NR6R7, SO2R8, P(=O)OR9OR10; R6, R7 = H, optionally substituted alkyl or acyl or aryl or aralkyl or alkene or alkyne, optionally substituted carbon cycle or aromatic heterocycle; R8, R9, R10 = optionally substituted alkyl or acyl or aryl or aralkyl or alkene or alkyne, optionally substituted carbon cycle or aromatic heterocycle; p = 2-10; when R'2 and R3 are taken separately one at least is NR4R5, when either R4 or R5 is NR6R7 then either R4 or R5 combined with R6 and/or R7 can form a cycle having 3-50 different hydrogen atoms. The ethylenically unsaturated monomer is of Formula CXX'(=CV-CV')+B=CH2 and the resultant first generation block polymer is of formula (II); R2, R3 = additionally S-(CXX'(CV=CV')B-CH2)n-R1 Second and further generation block polymers are prepared from a monoethylenically unsaturated monomer, a source of free radicals, the first or prior generation polymer and the specified control agents. The preparation of a block copolymer of Formula (I) from a monomer of formula CYY'(CW=CW')a=CH2 and the first generation polymer of Formula (II) is specifically claimed. An Independent claim is included for polymers capable of being produced by the claimed method. |
