SPIN SCRUBBER

摘要

PURPOSE: A spin scrubber is provided to be capable of preventing the front surface of the second wafer from being contaminated due to a brush used for cleaning the rear surface of the first wafer. CONSTITUTION: A spin scrubber(100) is provided with a process chamber(110), a turntable installed at the inner portion of the process chamber for fixing a semiconductor wafer, and a jet nozzle(150) for jetting the deionized water supplied from a deionized water supply source onto the semiconductor wafer. The spin scrubber further includes the first brush unit(130) for brushing the first surface of the semiconductor wafer and the second brush unit(140) for brushing the second surface of the semiconductor wafer. At this time, the first and second brush unit include a brush and an arm, respectively.