发明名称 |
Extreme ultraviolet mask with improved absorber |
摘要 |
The present invention discloses an EUV mask having an improved absorber layer with a certain thickness that is formed from a metal and a nonmetal in which the ratio of the metal to the nonmetal changes through the thickness of the improved absorber layer and a method of forming such an EUV mask.
|
申请公布号 |
US2003228530(A1) |
申请公布日期 |
2003.12.11 |
申请号 |
US20030461220 |
申请日期 |
2003.06.13 |
申请人 |
YAN PEI-YANG;ZHANG GUOJING |
发明人 |
YAN PEI-YANG;ZHANG GUOJING |
分类号 |
G03F1/08;G03F1/14;(IPC1-7):G03F1/08;G21K5/00;G03F7/20;G03F7/16;G03F7/40;G02B5/08;G02B5/20;G02B7/182;B05D5/06 |
主分类号 |
G03F1/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|