发明名称 Process of producing near-field light generating element
摘要 <p>Process of producing near-field light generating element is provided to make it possible to mass-produce near-field light generating elements at a low cost, which are high optical efficiency in use on optical memory devices or observation apparatus, and which makes it easy or unnecessary to carry out ultra-high precise positioning between the micro aperture and the luminous flux propagated from the near-field light generating element. The process of producing near-field light generating element of the invention includes steps of forming optical guide structure (101), irradiating convex-forming luminous flux from a surface different from the surface on which the convex-shaped portion is formed convex forming luminous flux irradiation process (102), forming a convex and forming a micro aperture. <IMAGE></p>
申请公布号 EP1139121(A3) 申请公布日期 2003.12.10
申请号 EP20010301662 申请日期 2001.02.23
申请人 SEIKO INSTRUMENTS INC. 发明人 KASAMA, NOBUYUKI;OUMI, MANABU;MITSUOKA, YASUYUKI;MAEDA, HIDETAKA;KATO, KENJI;NIWA, TAKASHI
分类号 G01Q60/22;G01Q80/00;G02B21/00;G11B7/135;G11B7/22;(IPC1-7):G02B3/00;G12B21/06;G12B21/02 主分类号 G01Q60/22
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