发明名称 Multiple redundant through hole electrical interconnects and method for forming the same
摘要 An apparatus incorporating multiple electrical interconnects extending through a substrate (e.g., a silicon wafer), and a method of forming the same. The electrical interconnects convey electrical signals through the substrate to structures mounted on the front side of the substrate. A conductive layer can be used to selectively distribute the electrical signals to the structures. Accordingly, it is not necessary to route electrical signals to the front side of the substrate in order to convey the signals to the structures. A structure can be coupled to multiple electrical interconnects in order to convey electrical signals along redundant paths through the substrate to the structure, improving reliability should one of the electrical interconnects fail.
申请公布号 US6659592(B2) 申请公布日期 2003.12.09
申请号 US20010932123 申请日期 2001.08.16
申请人 HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 发明人 VANDER PLAS HUBERT ALLEN;SNYDER BARRY CRAIG;HELLEKSON RON ALLEN;PAN ALFRED I-TSUNG
分类号 B41J2/14;(IPC1-7):B41J2/01 主分类号 B41J2/14
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