发明名称 THIN-FILM HEAD
摘要 PROBLEM TO BE SOLVED: To provide a thin-film head terminals which do not generate defective plating, even if they are made small. SOLUTION: The terminals are made by coating a photoresist on a substrate, forming a terminal pattern on the photoresist film, plating the region which is not covered by the photoresist, removing the photoresist, forming a protective film, and exposing the terminals by lapping. Between the developing and plating processes, the surface of the photoresist is RIE-treated in a O2 atmosphere to modify the photoresist surface to improve its wettability to the plating liquid, and air bubbles are eliminated from entangled in the terminal pattern, by decreasing the pressure to prevent defective plating. Thus, pole shaped terminals without defects are obtained. The head can be made small, since the terminals and their spacing can be made small. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003346308(A) 申请公布日期 2003.12.05
申请号 JP20030120896 申请日期 2003.04.25
申请人 HITACHI LTD;HITACHI KYOWA ENGINEERING CO LTD 发明人 YOSHIOKA KUMIKO;SHIINA HIROMI;SUZUKI SABURO;MASUDA KENZO;MORIJIRI MAKOTO
分类号 G11B5/31;(IPC1-7):G11B5/31 主分类号 G11B5/31
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