发明名称 SUBSTRATE TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate device which enables an operator to easily ascertain its conditions without complicating a device structure. SOLUTION: A gap sensor 42 detecting a distance between itself and an object located in the prescribed direction is mounted at a position on a bridge structure 4 of the substrate device so as to face the surface of a substrate. Before a resist solution is applied on the surface of the substrate, the bridge structure 4 is moved by linear motors 50 and 51 in the direction of an X axis, and a gap (hereafter referred to as G1) between the sensor 42 and the surface of the substrate is detected. Furthermore, the gap sensor 42 starts scanning to detect a gap (hereafter referred to as G2) between itself and the surface of the resist film when the application of the resist solution is finished. A gap difference between G1 and G2 is calculated to obtain the thickness of the resist film, and the obtained thickness of the resist film is compared with a prescribed value, whereby the application condition of a resist is determined, and the determination result is indicated on a display unit. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003347190(A) 申请公布日期 2003.12.05
申请号 JP20020150919 申请日期 2002.05.24
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KITAZAWA HIROYUKI;NAKAGAWA YOSHIYUKI
分类号 G03F7/38;B05C5/02;B05C11/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/38
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