发明名称 Lithographic apparatus
摘要 A kit of parts for assembling an optical element for use in a lithographic apparatus comprises a large number of different small pieces which direct light into respective regions of the pupil plane of the radiation system and/or change the polarization state of incident radiation. The previously manufactured pieces are selected and assembled into an optical element to rapidly create a desired intensity distribution. The optical element may also be disassembled and the pieces reused. <IMAGE>
申请公布号 EP1367446(A1) 申请公布日期 2003.12.03
申请号 EP20030253368 申请日期 2003.05.29
申请人 ASML NETHERLANDS B.V. 发明人 MULDER, HEINE MELLE;VAN GREEVENBROEK, HENDRIKUS ROBERTUS MARIE
分类号 G03F7/20;(IPC1-7):G03F7/20 主分类号 G03F7/20
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