发明名称 |
Lithographic apparatus |
摘要 |
A kit of parts for assembling an optical element for use in a lithographic apparatus comprises a large number of different small pieces which direct light into respective regions of the pupil plane of the radiation system and/or change the polarization state of incident radiation. The previously manufactured pieces are selected and assembled into an optical element to rapidly create a desired intensity distribution. The optical element may also be disassembled and the pieces reused. <IMAGE>
|
申请公布号 |
EP1367446(A1) |
申请公布日期 |
2003.12.03 |
申请号 |
EP20030253368 |
申请日期 |
2003.05.29 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MULDER, HEINE MELLE;VAN GREEVENBROEK, HENDRIKUS ROBERTUS MARIE |
分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|