发明名称 LIGHT REFLECTION FILM AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a light reflection film that has improved mechanical strength, has a structure for obtaining a sufficient reflection factor for light having a specific wavelength selected from a wide range of wavelength region, and can be easily configured; and to provide a manufacturing method of the light reflection film. SOLUTION: The light reflection film 1 comprises a substrate 20 having a light reception surface F20 to light L1 to be reflected, and a light reflection layer 40 having a light reflection surface F40 arranged on the light reception surface. The light reflection layer is in a configuration where a plurality of laminate units 10 are laminated. Each laminate unit has a configuration where at least three dielectric layers 11-14 made of a dielectric material are laminated, and at least three dielectric layers having a different refractive index in all dielectric layers in each laminate unit. Then, the refractive index of each dielectric layer in each laminate unit decreases from a layer 11 arranged at a position closest to the light reception surface of the substrate in each of the dielectric layers to a layer 14 arranged at a position farthest from the light reception surface. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003344645(A) 申请公布日期 2003.12.03
申请号 JP20020152845 申请日期 2002.05.27
申请人 HAMAMATSU PHOTONICS KK 发明人 OBAYASHI YASUSHI
分类号 G02B5/26;G02B5/28;(IPC1-7):G02B5/26 主分类号 G02B5/26
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