发明名称 METHOD AND APPARATUS FOR MEASURING POSITION, METHOD AND APPARATUS FOR EXPOSURE, AND MARK MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To obtain a high-precision focus measurement without depending on the surface condition of an object. SOLUTION: A measurement beam is projected to the surface of an object. A measurement result of the measurement beam reflected on the surface and a prescribed relational expression are used to measure the object position information in a normal direction on the surface. Based on the condition of a measured region on the surface of the object to which the measurement beam is projected, the prescribed relational expression is calibrated, as calibration processes S4-S7. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003338448(A) 申请公布日期 2003.11.28
申请号 JP20020146600 申请日期 2002.05.21
申请人 NIKON CORP 发明人 KANATANI YUHO
分类号 G01B11/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G01B11/00
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