发明名称 PHOTOREACTIVE RESIN COMPOSITION, AND METHOD FOR MANUFACTURING CIRCUIT BOARD AND CERAMIC MULTILAYER BOARD BY USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a photoreactive resin composition which has high sensitivity and is hard to cause gelation, and a method for manufacturing a circuit board and a multilayer board which have a high resolving degree wiring pattern and a via hole by the photolithography using the same. <P>SOLUTION: The photoreactive resin composition comprises a polyvalent metal powder and/or an inorganic powder containing a polyvalent metal oxide powder, a first alkali-soluble polymer having an ethylenically unsaturated double bond, a monomer having an ethylenically unsaturated double bond, a photoreaction initiator, an organic solvent, and a second polymer having a pyrrolidone ring in the side chain. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003335808(A) 申请公布日期 2003.11.28
申请号 JP20020081422 申请日期 2002.03.22
申请人 MURATA MFG CO LTD 发明人 KUBOTA MASAHIRO;INAMI MICHIAKI;WATANABE SHIZUHARU
分类号 H05K1/09;C08F2/44;C08F291/12;G03F7/004;H01L23/12;H05K3/02;H05K3/20;H05K3/46 主分类号 H05K1/09
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