| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to a radiation and suitable for use as a chemically amplified resist excellent in basic properties as a resist, such as sensitivity, resolution, dry etching resistance and pattern shape. <P>SOLUTION: The radiation-sensitive resin composition comprises (A) a resin which becomes alkali-soluble by the action of an acid and contains a repeating unit derived from (meth)acrylic esters typified by 1-(2-norbornyl)-1-methylethyl (meth)acrylate and 2-ethyl-2-adamantyl (meth)acrylate and a repeating unit derived from (meth)acrylic esters having a lactone skeleton typified by a compound represented by formula (i) or (ii) (where R is H or methyl) and (B) a radiation-sensitive acid generator. <P>COPYRIGHT: (C)2004,JPO |
