发明名称 |
Apparatus and method for detecting tilt angle of a wafer platform |
摘要 |
An apparatus and a method for detecting the tilt angle of a wafer platform in a process machine, particularly in a medium density ion implanter. The apparatus and method can be used to accurately calibrate the zero-angle position of a wafer platform in the medium energy ion implanter. The apparatus includes a process chamber that has a cavity and a wafer platform therein, a window that is substantially transparent to laser energy mounted in a top wall of the chamber, and a laser emitter and receiver positioned outside the process chamber juxtaposed to the window for emitting a laser beam onto a wafer positioned on the wafer platform and receiving a reflected laser beam to determine a tilt angle of the wafer platform by the intensity of the reflected laser beam.
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申请公布号 |
US2003218144(A1) |
申请公布日期 |
2003.11.27 |
申请号 |
US20020152862 |
申请日期 |
2002.05.22 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LIN HOM-CHUNG;LIN SONG-YUEHA;SUN HU-LI;YU CHI-FU;JIANG WU-HAN |
分类号 |
H01L21/68;(IPC1-7):G01N21/86;G01V8/00 |
主分类号 |
H01L21/68 |
代理机构 |
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主权项 |
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