发明名称 SELECTIVE DEPOSITION OF MATERIALS ON CONTOURED SURFACES
摘要 A material is selectively deposited on substrate having a contoured surface including protrusions and recesses. A first fluid is applied to the surface to contact the protrusions and not the recesses, and a first material is deposited on the substrate where the substrate is in contact with the fluid. A second fluid may be applied to contact the recesses, and a second material is deposited on the substrate where the substrate is in contact with the fluid. A third fluid may be applied, and a third material having affinity for one of the first and second materials is deposited only where one of the first and second materials is deposited. The first and second material may be a protein, and the first, second and third materials may respectively be cytophobic, cytophilic and a cell. The substrate may be formed of a polymer such as polydimethylsiloxane. A cell containment device is provided containing the substrate with a cytophobic material connected to the protrusions and a cytophilic material connected to the recesses.
申请公布号 WO02086452(A3) 申请公布日期 2003.11.27
申请号 WO2002US09149 申请日期 2002.03.25
申请人 PRESIDENT AND FELLOWS OF HARVARD COLLEGE;CHILDREN'S MEDICAL CENTER CORPORATION;OSTUNI, EMANUELE;CHEN, CHRISTOPHER, S.;INGBER, DONALD, E.;WHITESIDES, GEORGE, M. 发明人 OSTUNI, EMANUELE;CHEN, CHRISTOPHER, S.;INGBER, DONALD, E.;WHITESIDES, GEORGE, M.
分类号 B01L3/00 主分类号 B01L3/00
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