发明名称 METHOD OF DEPOSITING COPPER ON A SUPPORT
摘要 <p>The invention relates to a method of depositing copper on a support. The inventive method comprises the vapour phase conversion of a copper precursor which is in contact with the heated support and, optionally, in the presence of hydrogen. Said copper precursor is in the form of a CuCl or CuBr composition in a non-planar, non-aromatic liquid organic solvent which is free from heteroatoms and which has at least two unconjugated unsaturations.</p>
申请公布号 WO2003097651(P1) 申请公布日期 2003.11.27
申请号 FR2003001483 申请日期 2003.05.15
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