| 发明名称 |
CVD apparatus |
| 摘要 |
Device for chemical vapor deposition (CVD) coating of workpieces comprises a transport unit (2), coating stations (31, 32, 33, 34), an evacuating unit (19), and a unit for producing a plasma in partial regions of the coating stations. At least two workpieces are received by at least one of the coating stations. An Independent claim is also included for a process for CVD coating workpieces using the above device. |
| 申请公布号 |
EP1365043(A1) |
申请公布日期 |
2003.11.26 |
| 申请号 |
EP20030011736 |
申请日期 |
2003.05.23 |
| 申请人 |
SCHOTT GLAS;CARL-ZEISS-STIFTUNG TRADING AS SCHOTT GLAS |
发明人 |
ARNOLD, GREGOR;LUETTRINGHAUS-HENKEL, ANDREAS;BEHLE, STEPHAN, DR.;BICKER, MATTHIAS, DR. |
| 分类号 |
B05D7/24;B08B7/00;B08B9/42;B29C49/42;B65D23/02;B65G29/00;C03C17/00;C08J9/00;C23C14/04;C23C14/50;C23C14/56;C23C16/04;C23C16/40;C23C16/44;C23C16/455;C23C16/458;C23C16/50;C23C16/511;C23C16/54 |
主分类号 |
B05D7/24 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
