| 发明名称 |
PLASMA GENERATION AND PROCESSING WITH MULTIPLE RADIATION SOURCES |
| 摘要 |
Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a processing cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another. |
| 申请公布号 |
WO03096771(A1) |
申请公布日期 |
2003.11.20 |
| 申请号 |
WO2003US14038 |
申请日期 |
2003.05.07 |
| 申请人 |
DANA CORPORATION;KUMAR, SATYENDRA;KUMAR, DEVENDRA |
发明人 |
KUMAR, SATYENDRA;KUMAR, DEVENDRA |
| 分类号 |
B01J7/00;A62D3/00;B01D53/86;B01D53/92;B01J19/08;B01J19/12;B01J37/34;B22F3/105;C01B3/02;C21D1/06;C21D1/09;C21D1/38;C22B4/00;F01N3/08;F01N3/10;F01N3/20;F01N3/24;F01N3/28;F01N3/30;F01N9/00;F01N13/10;F27B17/00;F27D3/12;F27D11/08;F27D11/12;G21K5/00;H01J37/32;H01M8/06;H05B6/68;H05B6/78;H05B6/80;H05H1/24;H05H1/46 |
主分类号 |
B01J7/00 |
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