| 发明名称 |
Integrated semiconductor substrate bevel cleaning apparatus and method |
| 摘要 |
An integrated semiconductor substrate bevel cleaning system that enables transfer of substrates through the bevel cleaner either with or without substrate processing within the bevel cleaner. The invention provides an integrated bevel cleaning apparatus comprising a transfer position, a rinsing position and an etching position.
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| 申请公布号 |
US2003213772(A9) |
申请公布日期 |
2003.11.20 |
| 申请号 |
US20010785815 |
申请日期 |
2001.02.16 |
| 申请人 |
MOK YEUK-FAI EDWIN;KO ALEXANDER;DONOSO BERNARDO;STEVENS JOSEPH J. |
发明人 |
MOK YEUK-FAI EDWIN;KO ALEXANDER;DONOSO BERNARDO;STEVENS JOSEPH J. |
| 分类号 |
H01L21/00;(IPC1-7):C25F3/30;C23F1/00;H01L21/302;H01L21/461 |
主分类号 |
H01L21/00 |
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