发明名称 POROUS CONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a porous conductive film capable of being simply and inexpensively manufactured as compared with an electroplating method, a vacuum vapor deposition method, a conductive paste coating method or the like, requiring no heat treatment at a high temperature and capable of corresponding to a wide range of a base material, and a manufacturing method therefor. <P>SOLUTION: The conductive porous layer is obtained by forming a conductive porous layer, which has a three-dimensional reticulated skeleton with a skeleton mean diameter of 500 nm or less comprising an aggregate of fine particles of a metal and/or a metal oxide and has an open-cell structure, on the surface of and/or in the layer of a porous base material of which the solvent absorption per a unit area is 1 cc/m<SP>2</SP>or more. The manufacturing method therefor is also disclosed. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003326641(A) 申请公布日期 2003.11.19
申请号 JP20020135410 申请日期 2002.05.10
申请人 TOPPAN PRINTING CO LTD 发明人 KAMESHIMA HISAMITSU;MORITA MACHIKO
分类号 B01D53/22;B01D69/12;B32B5/22;B32B7/02;B32B15/14;H01B5/16;H01M4/86 主分类号 B01D53/22
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