发明名称 Semiconductor device and method of manufacturing same
摘要 A semiconductor device including an N-type semiconductor substrate which includes arsenic as an impurity, a first electrode formed on a main surface of the N-type semiconductor substrate, a ground surface formed on another surface of the N-type semiconductor substrate, a second electrode formed on the ground surface and ohmically-contacted with the N-type semiconductor substrate, a semiconductor element formed in the N-type semiconductor substrate and flowing current between the first electrode and the second electrode during ON-state thereof. The device has a reduced ON-resistance thereof.
申请公布号 US6649478(B2) 申请公布日期 2003.11.18
申请号 US20020283981 申请日期 2002.10.30
申请人 DENSO CORPORATION 发明人 OKABE YOSHIFUMI;YAMAOKA MASAMI;KUROYANAGI AKIRA
分类号 H01L21/28;H01L21/285;H01L21/304;H01L21/336;H01L29/06;H01L29/167;H01L29/34;H01L29/417;H01L29/45;H01L29/76;H01L29/78;H01L29/94;H01L31/062;(IPC1-7):H01L21/336;H01L21/26;H01L21/324 主分类号 H01L21/28
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