发明名称 |
APPARATUS FOR PLASMA SURFACE TREATMENT |
摘要 |
PURPOSE: An apparatus for plasma surface treatment is provided to be capable of locally carrying out a surface treatment at an aiming region alone regardless of the shape of a treatment object and increasing the speed of the surface treatment. CONSTITUTION: An apparatus for plasma surface treatment is provided with a laser generation part(1) for generating laser beam(2) having a predetermined power more than a plasma generating critical value and a focus forming part(4) for forming laser focus(6) by condensing the laser beam. The apparatus further includes a plurality of gas supply parts(22,23,24) for supplying plasma excitement gas and reaction gas to the laser focus. Preferably, the laser beam with a continuous wave is used and the laser power is more than 100 Watt.
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申请公布号 |
KR100407600(B1) |
申请公布日期 |
2003.11.18 |
申请号 |
KR20020060995 |
申请日期 |
2002.10.07 |
申请人 |
IMT CO., LTD.;KOREA INSTITUTE OF MACHINERY & MATERIALS |
发明人 |
LEE, JONG MYOUNG;LEE, JAE HOON |
分类号 |
H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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地址 |
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