发明名称 APPARATUS FOR PLASMA SURFACE TREATMENT
摘要 PURPOSE: An apparatus for plasma surface treatment is provided to be capable of locally carrying out a surface treatment at an aiming region alone regardless of the shape of a treatment object and increasing the speed of the surface treatment. CONSTITUTION: An apparatus for plasma surface treatment is provided with a laser generation part(1) for generating laser beam(2) having a predetermined power more than a plasma generating critical value and a focus forming part(4) for forming laser focus(6) by condensing the laser beam. The apparatus further includes a plurality of gas supply parts(22,23,24) for supplying plasma excitement gas and reaction gas to the laser focus. Preferably, the laser beam with a continuous wave is used and the laser power is more than 100 Watt.
申请公布号 KR100407600(B1) 申请公布日期 2003.11.18
申请号 KR20020060995 申请日期 2002.10.07
申请人 IMT CO., LTD.;KOREA INSTITUTE OF MACHINERY & MATERIALS 发明人 LEE, JONG MYOUNG;LEE, JAE HOON
分类号 H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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