| 摘要 |
PROBLEM TO BE SOLVED: To provide a device manufacturing device in which illumination and illumination nonuniformity can be measured in a shielding state and an exposure sequence using a stage can be performed or a wafer can be prepared and whose operation efficiency of the device can be improved. SOLUTION: In the device manufacturing device, a reticule 9 is illuminated with transmitted illumination by using light generated from a light source lamp 2, and an exposure lens 10 image-forms a pattern of the reticule 9 on a prescribed face. The device is provided with a shutter 4 shielding light from the light source lamp 2, a rear face reflecting optical sensor 6 measuring an arc position on an optical axis of light from the light source lamp 2, a sensor 13 measuring illumination nonuniformity on the face where the image is formed by the exposure lens 10, and an illumination measurement control part 14 adjusting the light source lamp 2 or an elliptic mirror 3 or both of them in accordance with a measurement value of the rear face reflecting optical sensor 6 or the sensor 13 or the measurement values of them. COPYRIGHT: (C)2004,JPO
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