SUBSTRATE PROCESSOR

摘要

PROBLEM TO BE SOLVED: To provide a substrate processor capable of effectively preventing a processing solution from being entrained to the other surface of the substrate and surely controlling the entrainment of the processing solution when supplying the processing solution to one surface of the substrate while rotating the substrate to process the substrate. SOLUTION: The substrate W is held at the upper surface side by an atmosphere shielding part 60 by utilizing Bernoulli's effect. A rotation transmitting member 68A for transmitting the rotation of the atmosphere shielding part 60 to the substrate W and a position regulation member for regulating the pop of the substrate W in the horizontal direction are projected from the shielding surface 61 of the shielding part 60. The rotation transmitting member 68 and the position regulation member are arranged with an interval in the rotational direction of the shielding member 60 on the peripheral edge part of the shielding surface 61. The rotation transmitting member 68 faces the peripheral part of the upper surface of the substrate W and the position regulation member faces the peripheral end face of the substrate W. COPYRIGHT: (C)2004,JPO