| 摘要 |
PROBLEM TO BE SOLVED: To precisely obtain a maximum logical yield when a photomask divided into a plurality of blocks is used. SOLUTION: A program is provided with steps (S1 to S3) for obtaining an arrangement amount of semiconductor elements when a plurality of the semiconductor elements are arranged on a wafer based on a size of the semiconductor element; a step (S4) for allocating a plurality of the blocks of the photomask in accordance with a plurality of the semiconductor elements arranged in the wafer; steps (S5 to S7) for obtaining whether a center of the photomask is on the wafer or not in arrangement of the photomask in respective exposures when the exposure is performed for the respective allocated blocks, subtracting the number of the semiconductor elements corresponding to the exposure, and calculating a remaining number of the arrangement amount when the center is not on the wafer; and steps (S8 to S9) for changing arrangement of the semiconductor elements to the wafer, repetitively performing respective processes and deciding the largest remaining number of the arrangement amount as the maximum logical yield. COPYRIGHT: (C)2004,JPO
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